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Machine Learning Approach for Characteristics Prediction of 4H-Silicon Carbide NMOSFET by Process Conditions

Authors
Ha, JonghyeonLee, GyeongyeopKim, Jungsik
Issue Date
2021
Publisher
IEEE
Keywords
Machine-Learning; LGBM; DNN; Silicon Carbide; NMOSFET; TCAD
Citation
2021 IEEE REGION 10 SYMPOSIUM (TENSYMP)
Indexed
SCOPUS
Journal Title
2021 IEEE REGION 10 SYMPOSIUM (TENSYMP)
URI
https://scholarworks.bwise.kr/gnu/handle/sw.gnu/5729
DOI
10.1109/TENSYMP52854.2021.9550872
ISSN
2640-821X
Abstract
In this work, the electrical characteristics with various process conditions in 4H-Silicon Carbide NMOSFET are analyzed by using various machine learning algorithms. Here, the methods of machine learning, Light Gradient Boost Machine (LGBM) and Deep Neural Network (DNN) are compared for data analysis generated by Technical Computer- Aided (TCAD) simulation. Through the methods of machine learning, we analyzed the influence of process parameters for electrical characteristics. This work provides the vision that machine learning is a powerful method for analyzing and optimizing the performance of the 4H-silicon carbide MOSFET.
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