Bistaggered Contact Geometry for Symmetric Dual-Gate Organic TFTs
- Authors
- Kwon, Jimin; Jung, Sungyeop; Kim, Yun-Hi; Jung, Sungjune
- Issue Date
- Jul-2019
- Publisher
- IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
- Keywords
- 2-D simulation; contact resistance; device geometry; independent gate control; thin-film transistors (TFTs)
- Citation
- IEEE TRANSACTIONS ON ELECTRON DEVICES, v.66, no.7, pp.3118 - 3123
- Indexed
- SCIE
SCOPUS
- Journal Title
- IEEE TRANSACTIONS ON ELECTRON DEVICES
- Volume
- 66
- Number
- 7
- Start Page
- 3118
- End Page
- 3123
- URI
- https://scholarworks.bwise.kr/gnu/handle/sw.gnu/9004
- DOI
- 10.1109/TED.2019.2917013
- ISSN
- 0018-9383
- Abstract
- This transaction proposes a symmetric bistaggered dual-gate organic thin-film transistor (TFT) to minimize the difference between the top and bottom channel current characteristics and demonstrates it through experiment and 2-D simulation. In dual-gate organic TFTs, asymmetric top and bottom channel currents are mainly a result of their asymmetric contact geometry. To address this geometric limitation, the contact electrodes were sandwiched between the two organic semiconductor layers to be placed in a staggered position to both top and bottom gates. Two-way current crowding at the bistaggered contact electrodes leads to high-charge injection efficiency in both channels.
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