Channel Length Dependence of Effective Barrier Height Experienced by Charge Carriers in Schottky-Barrier Transistors Based on Si-Nanowire Arraysopen access
- Authors
- Jeon, Dae-Young; Park, So Jeong; Pregl, Sebastian; Trommer, Jens; Heinzig, Andre; Mikolajick, Thomas; Weber, Walter M.
- Issue Date
- Mar-2025
- Publisher
- Institute of Electrical and Electronics Engineers Inc.
- Keywords
- Transistors; Charge carrier processes; Silicon; Performance evaluation; Logic gates; Thermionic emission; Phonons; Nanowires; Electrons; Tunneling; Channel length dependence; channel-limited conduction; Schottky-barrier dominant thermionic effect; Schottky-barrier transistors; Si-nanowires
- Citation
- IEEE Journal of the Electron Devices Society, v.13, pp 168 - 172
- Pages
- 5
- Indexed
- SCIE
SCOPUS
- Journal Title
- IEEE Journal of the Electron Devices Society
- Volume
- 13
- Start Page
- 168
- End Page
- 172
- URI
- https://scholarworks.gnu.ac.kr/handle/sw.gnu/77688
- DOI
- 10.1109/JEDS.2025.3547860
- ISSN
- 2168-6734
- Abstract
- Schottky-barrier (SB) transistors show great potential as advanced transistors for meeting power, performance, area, and cost requirements. In this study, the dominant transport mechanisms of SB Si-nanowire (NW) transistors were investigated with respect to channel length for accurate performance estimation and to provide key insights for practical applications. Evaluations of the temperature-dependent drain current, transconductance, and activation energy from SB Si-NW transistors revealed that the SB-dominant thermionic effect competes with Si-NW channel-limited conduction when the initial SB height is relatively low. Moreover, the Si-NW channel length was sufficiently long to dominate the total resistance, overcoming resistance effects arising from the SB.
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