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Channel Length Dependence of Effective Barrier Height Experienced by Charge Carriers in Schottky-Barrier Transistors Based on Si-Nanowire Arrays
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Jeon, Dae-Young | - |
| dc.contributor.author | Park, So Jeong | - |
| dc.contributor.author | Pregl, Sebastian | - |
| dc.contributor.author | Trommer, Jens | - |
| dc.contributor.author | Heinzig, Andre | - |
| dc.contributor.author | Mikolajick, Thomas | - |
| dc.contributor.author | Weber, Walter M. | - |
| dc.date.accessioned | 2025-04-04T06:30:14Z | - |
| dc.date.available | 2025-04-04T06:30:14Z | - |
| dc.date.issued | 2025-03 | - |
| dc.identifier.issn | 2168-6734 | - |
| dc.identifier.uri | https://scholarworks.gnu.ac.kr/handle/sw.gnu/77688 | - |
| dc.description.abstract | Schottky-barrier (SB) transistors show great potential as advanced transistors for meeting power, performance, area, and cost requirements. In this study, the dominant transport mechanisms of SB Si-nanowire (NW) transistors were investigated with respect to channel length for accurate performance estimation and to provide key insights for practical applications. Evaluations of the temperature-dependent drain current, transconductance, and activation energy from SB Si-NW transistors revealed that the SB-dominant thermionic effect competes with Si-NW channel-limited conduction when the initial SB height is relatively low. Moreover, the Si-NW channel length was sufficiently long to dominate the total resistance, overcoming resistance effects arising from the SB. | - |
| dc.format.extent | 5 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | Institute of Electrical and Electronics Engineers Inc. | - |
| dc.title | Channel Length Dependence of Effective Barrier Height Experienced by Charge Carriers in Schottky-Barrier Transistors Based on Si-Nanowire Arrays | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1109/JEDS.2025.3547860 | - |
| dc.identifier.scopusid | 2-s2.0-105001084019 | - |
| dc.identifier.wosid | 001450583000001 | - |
| dc.identifier.bibliographicCitation | IEEE Journal of the Electron Devices Society, v.13, pp 168 - 172 | - |
| dc.citation.title | IEEE Journal of the Electron Devices Society | - |
| dc.citation.volume | 13 | - |
| dc.citation.startPage | 168 | - |
| dc.citation.endPage | 172 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | Y | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Engineering | - |
| dc.relation.journalWebOfScienceCategory | Engineering, Electrical & Electronic | - |
| dc.subject.keywordPlus | BEHAVIOR | - |
| dc.subject.keywordAuthor | Transistors | - |
| dc.subject.keywordAuthor | Charge carrier processes | - |
| dc.subject.keywordAuthor | Silicon | - |
| dc.subject.keywordAuthor | Performance evaluation | - |
| dc.subject.keywordAuthor | Logic gates | - |
| dc.subject.keywordAuthor | Thermionic emission | - |
| dc.subject.keywordAuthor | Phonons | - |
| dc.subject.keywordAuthor | Nanowires | - |
| dc.subject.keywordAuthor | Electrons | - |
| dc.subject.keywordAuthor | Tunneling | - |
| dc.subject.keywordAuthor | Channel length dependence | - |
| dc.subject.keywordAuthor | channel-limited conduction | - |
| dc.subject.keywordAuthor | Schottky-barrier dominant thermionic effect | - |
| dc.subject.keywordAuthor | Schottky-barrier transistors | - |
| dc.subject.keywordAuthor | Si-nanowires | - |
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