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Channel Length Dependence of Effective Barrier Height Experienced by Charge Carriers in Schottky-Barrier Transistors Based on Si-Nanowire Arrays

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dc.contributor.authorJeon, Dae-Young-
dc.contributor.authorPark, So Jeong-
dc.contributor.authorPregl, Sebastian-
dc.contributor.authorTrommer, Jens-
dc.contributor.authorHeinzig, Andre-
dc.contributor.authorMikolajick, Thomas-
dc.contributor.authorWeber, Walter M.-
dc.date.accessioned2025-04-04T06:30:14Z-
dc.date.available2025-04-04T06:30:14Z-
dc.date.issued2025-03-
dc.identifier.issn2168-6734-
dc.identifier.urihttps://scholarworks.gnu.ac.kr/handle/sw.gnu/77688-
dc.description.abstractSchottky-barrier (SB) transistors show great potential as advanced transistors for meeting power, performance, area, and cost requirements. In this study, the dominant transport mechanisms of SB Si-nanowire (NW) transistors were investigated with respect to channel length for accurate performance estimation and to provide key insights for practical applications. Evaluations of the temperature-dependent drain current, transconductance, and activation energy from SB Si-NW transistors revealed that the SB-dominant thermionic effect competes with Si-NW channel-limited conduction when the initial SB height is relatively low. Moreover, the Si-NW channel length was sufficiently long to dominate the total resistance, overcoming resistance effects arising from the SB.-
dc.format.extent5-
dc.language영어-
dc.language.isoENG-
dc.publisherInstitute of Electrical and Electronics Engineers Inc.-
dc.titleChannel Length Dependence of Effective Barrier Height Experienced by Charge Carriers in Schottky-Barrier Transistors Based on Si-Nanowire Arrays-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1109/JEDS.2025.3547860-
dc.identifier.scopusid2-s2.0-105001084019-
dc.identifier.wosid001450583000001-
dc.identifier.bibliographicCitationIEEE Journal of the Electron Devices Society, v.13, pp 168 - 172-
dc.citation.titleIEEE Journal of the Electron Devices Society-
dc.citation.volume13-
dc.citation.startPage168-
dc.citation.endPage172-
dc.type.docTypeArticle-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.subject.keywordPlusBEHAVIOR-
dc.subject.keywordAuthorTransistors-
dc.subject.keywordAuthorCharge carrier processes-
dc.subject.keywordAuthorSilicon-
dc.subject.keywordAuthorPerformance evaluation-
dc.subject.keywordAuthorLogic gates-
dc.subject.keywordAuthorThermionic emission-
dc.subject.keywordAuthorPhonons-
dc.subject.keywordAuthorNanowires-
dc.subject.keywordAuthorElectrons-
dc.subject.keywordAuthorTunneling-
dc.subject.keywordAuthorChannel length dependence-
dc.subject.keywordAuthorchannel-limited conduction-
dc.subject.keywordAuthorSchottky-barrier dominant thermionic effect-
dc.subject.keywordAuthorSchottky-barrier transistors-
dc.subject.keywordAuthorSi-nanowires-
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