Electrochemical properties of Si film electrodes deposited on electrochemically etched Cu substrate

안효준

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Electrochemical properties of Si film electrodes deposited on electrochemically etched Cu substrate

Authors: 안효준

Issue Date: 16-Jun-2009

URI: https://scholarworks.gnu.ac.kr/handle/sw.gnu/66838

Conference Name: ISFM2009 Abstract Book

Location: 대한민국

Conference Date: 2009-06-15 ~ 2009-06-18

metadata.conference.dc.citation.conferenceName: The 3rd International Symposium on Functional Materials

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Appears in Collections: 공학계열 > Dept.of Materials Engineering and Convergence Technology > Conference Papers

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Ahn, Hyo Jun: 대학원 (나노신소재융합공학과)

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