Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Electrochemical properties of Si film electrodes deposited on electrochemically etched Cu substrate
Full metadata record
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안효준 | - |
| dc.date.accessioned | 2023-08-05T05:44:42Z | - |
| dc.date.available | 2023-08-05T05:44:42Z | - |
| dc.date.issued | 2009-06-16 | - |
| dc.identifier.uri | https://scholarworks.gnu.ac.kr/handle/sw.gnu/66838 | - |
| dc.title | Electrochemical properties of Si film electrodes deposited on electrochemically etched Cu substrate | - |
| dc.type | Conference | - |
| dc.citation.title | ISFM2009 Abstract Book | - |
| dc.citation.conferenceName | The 3rd International Symposium on Functional Materials | - |
| dc.citation.conferencePlace | 대한민국 | - |
| dc.citation.conferenceDate | 2009-06-15 ~ 2009-06-18 | - |
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 공학계열 > Dept.of Materials Engineering and Convergence Technology > Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.