Decomposition of Vertical and Lateral Charge Loss in Long-term Retention of 3-D NAND Flash Memory
- Authors
- Park, J.; Yoon, G.; Go, D.; Kim, D.; An, U.; Kim, Jongwoo; Kim, Jungsik; Lee, J.-S.
- Issue Date
- Mar-2023
- Publisher
- Institute of Electrical and Electronics Engineers Inc.
- Keywords
- 3-D NAND flash memory; data retention; lateral migration
- Citation
- IEEE International Reliability Physics Symposium Proceedings, v.2023-March
- Indexed
- SCOPUS
- Journal Title
- IEEE International Reliability Physics Symposium Proceedings
- Volume
- 2023-March
- URI
- https://scholarworks.gnu.ac.kr/handle/sw.gnu/59618
- DOI
- 10.1109/IRPS48203.2023.10117868
- ISSN
- 1541-7026
- Abstract
- For long-term retention characteristics of 3-D NAND flash memory, a method is proposed to decompose the measured V_T shift into several charge loss mechanisms, including lateral migration (LM), band-to-trap tunneling (BT), trap-to-band tunneling (TB), and thermal emission (TE). Based on the Δ V_T of the E-E-E pattern (EEE) at room temperature, the LM mechanisms of the P-E-P pattern (PEP) at high temperature (120 °C) are separated into the LM caused by hole (LMH) and electron (LME), respectively. Finally, the E-P-E pattern (EPE) and PEP are successfully decomposed into LMH, LME, TE, BT, and TB of trapped charges in the nitride layer. The proposed methodology is promising to quantitatively evaluate the charge loss mechanism in 3-D NAND flash memory. © 2023 IEEE.
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 공과대학 > 전기공학과 > Journal Articles

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.