Investigation of TID and DD Effects on FD SOI Nanowire FET Induced by Proton Irradiation
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초록

In this study, radiation-induced degradation, which is caused by total ionizing dose (TID) and displacement defect (DD) effect, is investigated in fully depleted silicon-on-insulator (FD SOI) nanowire field-effect transistors (NWFETs) under 25-MeV proton irradiation. The combined effect of TID and DD degraded the subthreshold swing (SS) and OFF-state current (Ioff) of n-type FD SOI NWFETs, while it degraded the threshold voltage (Vth) and ON-state current (Ion) of p-type FD SOI NWFETs. This degradation was sensitive to increases in proton fluence. Additionally, as the gate length (Lg) decreased, the degradation due to DD effect increased, aggravating the degradation due to the combined effects of TID and DD. However, narrow devices with improved side gate control mitigated the effects of the interface traps, oxide traps, positive charge trapped in the spacer, and DD. © 1963-2012 IEEE.

키워드

Displacement defect (DD)fully depleted silicon-on-insulator (FD SOI) nanowire field-effect transistor (NWFET)geometry dependenceprotonradiation-induced narrow channel effect (RINCE)technology computer-aided design (TCAD)total ionizing dose (TID)DISPLACEMENT DAMAGECOSMIC-RAYSFINFETSDEPENDENCEGEOMETRYNARROWIMPACTBULK
제목
Investigation of TID and DD Effects on FD SOI Nanowire FET Induced by Proton Irradiation
저자
Lee, DabokHa, JonghyeonSuh, MinkiRyu, MinsangCasse, MikaelNicoletti, SergioJeon, Dae-YoungKim, Jungsik
DOI
10.1109/TED.2025.3558489
발행일
2025-06
유형
Article
저널명
IEEE Transactions on Electron Devices
72
6
페이지
2795 ~ 2800