Decomposition of Vertical and Lateral Charge Loss in Long-term Retention of 3-D NAND Flash Memory

  • Park, J.; 
  • Yoon, G.; 
  • Go, D.; 
  • Kim, D.; 
  • An, U.; 
  • ... Kim, Jungsik; 
  • 외 2명
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초록

For long-term retention characteristics of 3-D NAND flash memory, a method is proposed to decompose the measured V_T shift into several charge loss mechanisms, including lateral migration (LM), band-to-trap tunneling (BT), trap-to-band tunneling (TB), and thermal emission (TE). Based on the Δ V_T of the E-E-E pattern (EEE) at room temperature, the LM mechanisms of the P-E-P pattern (PEP) at high temperature (120 °C) are separated into the LM caused by hole (LMH) and electron (LME), respectively. Finally, the E-P-E pattern (EPE) and PEP are successfully decomposed into LMH, LME, TE, BT, and TB of trapped charges in the nitride layer. The proposed methodology is promising to quantitatively evaluate the charge loss mechanism in 3-D NAND flash memory. © 2023 IEEE.

키워드

3-D NAND flash memory; data retention; lateral migration; MODEL; OPERATION; DEVICES
제목
Decomposition of Vertical and Lateral Charge Loss in Long-term Retention of 3-D NAND Flash Memory
저자
Park, J.; Yoon, G.; Go, D.; Kim, D.; An, U.; Kim, Jongwoo; Kim, Jungsik; Lee, J.-S.
DOI
10.1109/IRPS48203.2023.10117868
발행일
2023-03
유형
Proceedings Paper
저널명
IEEE International Reliability Physics Symposium Proceedings
권
2023-March