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Analysis of Charge Loss Decomposition and Nonlinear Ea in 3-D NAND Flash Memory Using a Neutral Cell-Based Method

Authors
Park, JounghunGo, DonghyunKim, DonghwiKim, JungsikLee, Jeong-Soo
Issue Date
Dec-2025
Publisher
Institute of Electrical and Electronics Engineers
Keywords
3-D NAND flash memory; activation energy; charge loss decomposition; retention reliability
Citation
IEEE Electron Device Letters, v.46, no.12, pp 2273 - 2276
Pages
4
Indexed
SCIE
SCOPUS
Journal Title
IEEE Electron Device Letters
Volume
46
Number
12
Start Page
2273
End Page
2276
URI
https://scholarworks.gnu.ac.kr/handle/sw.gnu/80726
DOI
10.1109/LED.2025.3622466
ISSN
0741-3106
1558-0563
Abstract
A charge loss decomposition method using neutral cells has been proposed in 3-D NAND flash memory. The pattern-dependent threshold voltage (VT) equations and E-field acceleration factors are derived to analyze the temperature-dependent behavior of charge loss mechanisms. The program-erase-program (PEP) pattern exhibits the most significant lateral migration of holes (LMH) at 120 °C, while the erase-program-erase (EPE) pattern consistently shows the largest trap-to-band tunneling of electrons (TBE), regardless of retention temperatures. The activation energy (Ea) of the EPE pattern has been extracted, revealing that the nonlinear Ea behavior is primarily caused by TBE.
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