Detailed Information

Cited 3 time in webofscience Cited 6 time in scopus
Metadata Downloads

Investigation Into the Degradation of DDR4 DRAM Owing to Total Ionizing Dose Effects

Full metadata record
DC Field Value Language
dc.contributor.authorLee, Gyeongyeop-
dc.contributor.authorSuh, Minki-
dc.contributor.authorRyu, Minsang-
dc.contributor.authorLee, Yunjong-
dc.contributor.authorHan, Jin-Woo-
dc.contributor.authorKim, Jungsik-
dc.date.accessioned2023-10-06T02:40:55Z-
dc.date.available2023-10-06T02:40:55Z-
dc.date.issued2023-09-
dc.identifier.issn2169-3536-
dc.identifier.urihttps://scholarworks.gnu.ac.kr/handle/sw.gnu/68055-
dc.description.abstractTotal ionizing dose (TID) effects of gamma rays were investigated on DDR4 dynamic random access memory (DRAM) and analyzed using TCAD simulations. In this study, we considered the operating states, dose rates, temperatures, and annealing to analyze the impact of TID under different conditions. The worst degradation was observed in the operated state and at a low-dose rate because of the absence of an electrostatic barrier that reduced the possibility of interface trap formation under unbiased and high-dose rate conditions. At lower temperatures, the effects of radiation were mitigated by the reduced production of protons ( H+). In addition, the unbiased DRAM and high-temperature conditions are the fastest to recover during post-irradiation annealing. In TCAD simulations, the retention time decreased with increasing temperature because the band-to-band tunneling (BTBT) generation increased. Furthermore, the retention time and row activation latency ( tRCD) degraded as the concentration of the interface traps increased. This is because the interface traps caused leakage currents and hindered the flow of electrons. © 2013 IEEE.-
dc.format.extent10-
dc.language영어-
dc.language.isoENG-
dc.publisherInstitute of Electrical and Electronics Engineers Inc.-
dc.titleInvestigation Into the Degradation of DDR4 DRAM Owing to Total Ionizing Dose Effects-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1109/ACCESS.2023.3312926-
dc.identifier.scopusid2-s2.0-85171597498-
dc.identifier.wosid001068799500001-
dc.identifier.bibliographicCitationIEEE Access, v.11, pp 97456 - 97465-
dc.citation.titleIEEE Access-
dc.citation.volume11-
dc.citation.startPage97456-
dc.citation.endPage97465-
dc.type.docTypeArticle-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaComputer Science-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaTelecommunications-
dc.relation.journalWebOfScienceCategoryComputer Science, Information Systems-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryTelecommunications-
dc.subject.keywordAuthorAnnealing-
dc.subject.keywordAuthorDDR4-
dc.subject.keywordAuthordose rate-
dc.subject.keywordAuthorDRAM-
dc.subject.keywordAuthorgamma ray-
dc.subject.keywordAuthorinterface trap-
dc.subject.keywordAuthoroperation-
dc.subject.keywordAuthorretention time-
dc.subject.keywordAuthortemperature-
Files in This Item
There are no files associated with this item.
Appears in
Collections
공학계열 > 전기공학과 > Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Kim, Jung Sik photo

Kim, Jung Sik
IT공과대학 (전기공학과)
Read more

Altmetrics

Total Views & Downloads

BROWSE