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Structural and electrical properties of vanadium tungsten oxide thin films Grown on Pt/TiO2/SiO2/Si substrates
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Nam, Sung-Pill | - |
| dc.contributor.author | Lee, Sung-Gap | - |
| dc.contributor.author | Lee, Young-Hie | - |
| dc.date.accessioned | 2022-12-27T05:18:29Z | - |
| dc.date.available | 2022-12-27T05:18:29Z | - |
| dc.date.issued | 2009-04 | - |
| dc.identifier.issn | 1229-9162 | - |
| dc.identifier.issn | 2672-152X | - |
| dc.identifier.uri | https://scholarworks.gnu.ac.kr/handle/sw.gnu/26349 | - |
| dc.description.abstract | V1.9W0.1O5 thin films deposited on Pt/Ti/SiO2/Si substrates by an RF sputtering method exhibited fairly good and dielectric properties. It was found that film crystallinity, dielectric properties, and TCR properties were strongly dependent upon the annealing temperature. The dielectric constant of the V1.9W0.1O5 thin film annealed at 300 degrees C was 37.7, with a dielectric loss of 2.535, respectively. Also, the TCR values of the V1.9W0.1O5 thin films annealed at 300 degrees C were about -3.6%/K | - |
| dc.format.extent | 3 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | KOREAN ASSOC CRYSTAL GROWTH, INC | - |
| dc.title | Structural and electrical properties of vanadium tungsten oxide thin films Grown on Pt/TiO2/SiO2/Si substrates | - |
| dc.type | Article | - |
| dc.publisher.location | 대한민국 | - |
| dc.identifier.scopusid | 2-s2.0-67649834084 | - |
| dc.identifier.wosid | 000266080400021 | - |
| dc.identifier.bibliographicCitation | JOURNAL OF CERAMIC PROCESSING RESEARCH, v.10, no.2, pp 224 - 226 | - |
| dc.citation.title | JOURNAL OF CERAMIC PROCESSING RESEARCH | - |
| dc.citation.volume | 10 | - |
| dc.citation.number | 2 | - |
| dc.citation.startPage | 224 | - |
| dc.citation.endPage | 226 | - |
| dc.type.docType | Article | - |
| dc.identifier.kciid | ART001468391 | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.description.journalRegisteredClass | kci | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Ceramics | - |
| dc.subject.keywordAuthor | Vanadium | - |
| dc.subject.keywordAuthor | Tungsten | - |
| dc.subject.keywordAuthor | Thin film | - |
| dc.subject.keywordAuthor | TCR | - |
| dc.subject.keywordAuthor | Dielectric property | - |
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