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초정밀 자기연마 가공 기술과 최근 연구Magnetic Abrasive Polishing and Its Application

Other Titles
Magnetic Abrasive Polishing and Its Application
Authors
곽태수곽재섭
Issue Date
2012
Publisher
한국정밀공학회
Keywords
탄소 나노튜브; 전자석 테이블; 자기연마가공; 실리콘 겔 매개체; 이송 폭; Carbon Nanotube; Electro-Magnet Array Table; Magnetic Abrasive Polishing; Silicone Gel Agent; Step-over
Citation
한국정밀공학회지, v.29, no.3, pp 266 - 272
Pages
7
Indexed
KCI
Journal Title
한국정밀공학회지
Volume
29
Number
3
Start Page
266
End Page
272
URI
https://scholarworks.gnu.ac.kr/handle/sw.gnu/22580
ISSN
1225-9071
2287-8769
Abstract
This paper has aims to share fundamental knowledge for magnetic abrasive polishing and to mainly introduce recent research results. In order to enhance a magnetic flux density for nonferrous materials, advanced magnetic abrasive polishing system which is called 2nd generation system was established by electro-magnet array table, and the effectiveness of the electromagnet array table was evaluated in real polishing experiments. To increase adhesiveness of the abrasives in high speed polishing, a silicone gel agent was proposed and carbon nanotube particles as new magnetic abrasives were applied in the magnetic abrasive polishing. In addition,a strategy for optimal step-over determination by heuristic algorithm was introduced for applying large size workpiece. Curved surfaces
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융합기술공과대학 > 기계소재융합공학부 > Journal Articles

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Kwak, Tae Soo
우주항공대학 (항공우주공학부)
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