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초정밀 자기연마 가공 기술과 최근 연구
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 곽태수 | - |
| dc.contributor.author | 곽재섭 | - |
| dc.date.accessioned | 2022-12-27T02:05:13Z | - |
| dc.date.available | 2022-12-27T02:05:13Z | - |
| dc.date.issued | 2012 | - |
| dc.identifier.issn | 1225-9071 | - |
| dc.identifier.issn | 2287-8769 | - |
| dc.identifier.uri | https://scholarworks.gnu.ac.kr/handle/sw.gnu/22580 | - |
| dc.description.abstract | This paper has aims to share fundamental knowledge for magnetic abrasive polishing and to mainly introduce recent research results. In order to enhance a magnetic flux density for nonferrous materials, advanced magnetic abrasive polishing system which is called 2nd generation system was established by electro-magnet array table, and the effectiveness of the electromagnet array table was evaluated in real polishing experiments. To increase adhesiveness of the abrasives in high speed polishing, a silicone gel agent was proposed and carbon nanotube particles as new magnetic abrasives were applied in the magnetic abrasive polishing. In addition,a strategy for optimal step-over determination by heuristic algorithm was introduced for applying large size workpiece. Curved surfaces | - |
| dc.format.extent | 7 | - |
| dc.language | 한국어 | - |
| dc.language.iso | KOR | - |
| dc.publisher | 한국정밀공학회 | - |
| dc.title | 초정밀 자기연마 가공 기술과 최근 연구 | - |
| dc.title.alternative | Magnetic Abrasive Polishing and Its Application | - |
| dc.type | Article | - |
| dc.publisher.location | 대한민국 | - |
| dc.identifier.bibliographicCitation | 한국정밀공학회지, v.29, no.3, pp 266 - 272 | - |
| dc.citation.title | 한국정밀공학회지 | - |
| dc.citation.volume | 29 | - |
| dc.citation.number | 3 | - |
| dc.citation.startPage | 266 | - |
| dc.citation.endPage | 272 | - |
| dc.identifier.kciid | ART001634312 | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | kci | - |
| dc.subject.keywordAuthor | 탄소 나노튜브 | - |
| dc.subject.keywordAuthor | 전자석 테이블 | - |
| dc.subject.keywordAuthor | 자기연마가공 | - |
| dc.subject.keywordAuthor | 실리콘 겔 매개체 | - |
| dc.subject.keywordAuthor | 이송 폭 | - |
| dc.subject.keywordAuthor | Carbon Nanotube | - |
| dc.subject.keywordAuthor | Electro-Magnet Array Table | - |
| dc.subject.keywordAuthor | Magnetic Abrasive Polishing | - |
| dc.subject.keywordAuthor | Silicone Gel Agent | - |
| dc.subject.keywordAuthor | Step-over | - |
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