Detailed Information

Cited 17 time in webofscience Cited 22 time in scopus
Metadata Downloads

High-cycle fatigue strength and small-crack growth behavior of ultrafine-grained copper with post-ECAP annealing

Authors
Goto, M.Teshima, N.Han, S. Z.Euh, K.Yakushiji, T.Kim, S. S.Lee, J.
Issue Date
Sep-2013
Publisher
PERGAMON-ELSEVIER SCIENCE LTD
Keywords
Equal channel angular pressing; Grain coarsening; Copper; Fatigue; Crack propagation
Citation
ENGINEERING FRACTURE MECHANICS, v.110, pp 218 - 232
Pages
15
Indexed
SCI
SCIE
SCOPUS
Journal Title
ENGINEERING FRACTURE MECHANICS
Volume
110
Start Page
218
End Page
232
URI
https://scholarworks.gnu.ac.kr/handle/sw.gnu/20492
DOI
10.1016/j.engfracmech.2013.07.018
ISSN
0013-7944
1873-7315
Abstract
The effects of post equal channel angular pressing annealing on microstructure and high-cycle fatigue behavior of ultrafine-grained copper were examined. Grains with sizes up to a few tens of micrometers surrounded by fine grains were formed after the annealing as a result of discontinuous recrystallization. The fatigue life of annealed samples in the short- and medium-life fields was found to decrease, while in the long-life field, the fatigue strength at 3 x 10(7) cycles was about 9% greater than that of ultrafine-grained copper without annealing. Long-term stressing for as-received ultrafine-grained samples produced large grains over 100 mu m as a result of dynamic recovery and recrystallization. For annealed samples, there were no significant differences in grain sizes between pre- and post-stressing, showing the higher stability of bimodal microstructure. This stability was related to the slightly increased fatigue strength in long life fields. The effect of bimodal microstructure on the growth behavior of small surface-cracks was discussed. (C) 2013 Elsevier Ltd. All rights reserved.
Files in This Item
There are no files associated with this item.
Appears in
Collections
공학계열 > Dept.of Materials Engineering and Convergence Technology > Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Kim, Sang Shik photo

Kim, Sang Shik
대학원 (나노신소재융합공학과)
Read more

Altmetrics

Total Views & Downloads

BROWSE