RF 플라즈마를 이용한 순수 바나늄 분말의 구상화 거동 연구

Spheroidization of Pure-vanadium Powder using Radio Frequency Thermal Plasma Process
  • Nana Kwabena Adomako; 
  • 양승민; 
  • 이민규; 
  • N. S. Reddy; 
  • 김정한

초록

In the present work, spheroidization of angular vanadium powders using a radio frequency (RF) thermal plasma process is investigated. Initially, angular vanadium powders are spheroidized successfully at an average particle size of 100 μm using the RF-plasma process. It is difficult to avoid oxide layer formation on the surface of vanadium powder during the RF-plasma process. Titanium/vanadium/stainless steel functionally graded materials are manufactured with vanadium as the interlayer. Vanadium intermediate layers are deposited using both angular and spheroidized vanadium powders. Then, 17-4PH stainless steel is successfully deposited on the vanadium interlayer made from the angular powder. However, on the surface of the vanadium interlayer made from the spheroidized powder, delamination of 17-4PH occurs during deposition. The main cause of this phenomenon is presumed to be the high thickness of the vanadium interlayer and the relatively high level of surface oxidation of the interlayer.

키워드

Powder; Spheroidization; Angular; Plasma; Particle size
제목
RF 플라즈마를 이용한 순수 바나늄 분말의 구상화 거동 연구
제목 (타언어)
Spheroidization of Pure-vanadium Powder using Radio Frequency Thermal Plasma Process
저자
Nana Kwabena Adomako; 양승민; 이민규; N. S. Reddy; 김정한
DOI
10.4150/KPMI.2019.26.4.305
발행일
2019-07
저널명
한국분말재료학회지
권
26
호
4
페이지
305 ~ 310