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Facile fabrication of patterned Si film electrodes containing trench-structured Cu current collectors for thin-film batteries
- Cho, Gyu-bong;
- Kim, Jae-kwang;
- Lee, Sang-hoon;
- Kim, Guk-tae;
- Noh, Jung-pil;
- ... Cho, Kwon-koo;
- ... Kim, Ki-won;
- ... Ahn, Hyo-jun;
- 외 1명
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24초록
In this study, two types of patterned (wholly and selectively covered) Si film electrodes containing trench-structured Cu current collectors are proposed for use in thin-film Li-ion batteries. The proposed electrodes are fabricated using a standard laser printer and electrochemical etching. The formation of the trench structure in the Si film electrodes results in improved electrochemical performance compared to conventional continuous Si film electrodes. The wholly covered Si film (WCS) electrode exhibits an 18.5% increase in capacity compared to the continuous Si film electrode. The selectively covered Si film (SCS) electrode, which is covered by Si film only at the bottom of the trenches, exhibits better electrochemical performance than the WCS electrode. An SCS electrode with a trench width of 45 mu m and trench height of 14.3 mu m exhibits the best electrochemical properties in terms of efficiency (85% in the first cycle) and cycle performance (60% capacity retention after 100 cycles). (C) 2016 Elsevier Ltd. All rights reserved.
키워드
- 제목
- Facile fabrication of patterned Si film electrodes containing trench-structured Cu current collectors for thin-film batteries
- 저자
- Cho, Gyu-bong; Kim, Jae-kwang; Lee, Sang-hoon; Kim, Guk-tae; Noh, Jung-pil; Cho, Kwon-koo; Kim, Ki-won; Nam, Tae-hyun; Ahn, Hyo-jun
- 발행일
- 2017-01
- 유형
- Article
- 권
- 224
- 페이지
- 649 ~ 659
- 언어
- ENG
- 출판사
- Pergamon Press Ltd.
- 발행국가
- 영국
- 분량
- 11 페이지
- ISSN
- E 1873-3859
P 0013-4686