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Molecular scale mechanism on evaporation and removal process of adherent molecules on surface by burnt gas
- Yang, Y.-J.;
- Lee, C.-W.;
- Kadosaka, O.;
- Shibahara, M.;
- Katsuki, M.;
- 외 1명
SCOPUS
0초록
The interaction between adherent molecules and gas molecules was modeled in the molecular scale and simulated by the molecular dynamics method in order to understand evaporation and removal processes of adherent molecules on metallic surface using high temperature gas flow. Methanol molecules were chosen as adherent molecules to investigate effects of adhesion quantity and gas molecular collisions because the industrial oil has too complex structures of fatty acid. Effects of adherent quantity, gas temperature, surface temperature and adhesion strength for the evaporation rate of adherent molecules and the molecular removal mechanism were investigated and discussed in the present study. Evaporation and removal rates of adherent molecules from metallic surface calculated by the molecular dynamics method showed the similar dependence on the surface temperature shown in the experimental results. Copyright ? 2006 KSAE.
키워드
- 제목
- Molecular scale mechanism on evaporation and removal process of adherent molecules on surface by burnt gas
- 저자
- Yang, Y.-J.; Lee, C.-W.; Kadosaka, O.; Shibahara, M.; Katsuki, M.; Kim, S.-P.
- 발행일
- 2006
- 유형
- Article
- 권
- 7
- 호
- 2
- 페이지
- 121 ~ 128
- 언어
- ENG
- 발행국가
- 대한민국
- 분량
- 8 페이지
- ISSN
- E 1976-3832
P 1229-9138