Molecular scale mechanism on evaporation and removal process of adherent molecules on surface by burnt gas

  • Yang, Y.-J.; 
  • Lee, C.-W.; 
  • Kadosaka, O.; 
  • Shibahara, M.; 
  • Katsuki, M.; 
  • 외 1명
Citations

SCOPUS

0

초록

The interaction between adherent molecules and gas molecules was modeled in the molecular scale and simulated by the molecular dynamics method in order to understand evaporation and removal processes of adherent molecules on metallic surface using high temperature gas flow. Methanol molecules were chosen as adherent molecules to investigate effects of adhesion quantity and gas molecular collisions because the industrial oil has too complex structures of fatty acid. Effects of adherent quantity, gas temperature, surface temperature and adhesion strength for the evaporation rate of adherent molecules and the molecular removal mechanism were investigated and discussed in the present study. Evaporation and removal rates of adherent molecules from metallic surface calculated by the molecular dynamics method showed the similar dependence on the surface temperature shown in the experimental results. Copyright ? 2006 KSAE.

키워드

Adherent molecules; Burnt gas; Evaporation; Molecular dynamics method; Surface treatment
제목
Molecular scale mechanism on evaporation and removal process of adherent molecules on surface by burnt gas
저자
Yang, Y.-J.; Lee, C.-W.; Kadosaka, O.; Shibahara, M.; Katsuki, M.; Kim, S.-P.
발행일
2006
유형
Article
저널명
International Journal of Automotive Technology
권
7
호
2
페이지
121 ~ 128