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Influence of Deposition Parameters on Performance of Zn(O,S) Buffer Layer Deposited by Solution-Based Continuous Flow Reactor for CIGS Solar Cells

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dc.contributor.authorRyu, Sang Ouk-
dc.contributor.authorJun, Ho Young-
dc.date.accessioned2024-06-05T02:00:19Z-
dc.date.available2024-06-05T02:00:19Z-
dc.date.issued2024-03-
dc.identifier.issn1555-130X-
dc.identifier.issn1555-1318-
dc.identifier.urihttps://scholarworks.gnu.ac.kr/handle/sw.gnu/70745-
dc.description.abstractCdS thin films are commonly used as buffer layers in hetero-junction structured CIGS thin film solar cells. However, the toxicity of Cd has raised concerns regarding environmental safety and alternative materials have been explored. ZnS is a leading candidate to replace Cd, with the presence of Zn(O,S) impurities known to be required for efficient CIGS solar cell fabrication. In this study, we synthesized Zn(O,S) films using a solution-based deposition method combining a continuous flow reactor (CFR) with another solutionbased deposition method. X-ray diffraction (XRD) and scanning electron microscopy (SEM) were used to characterize the structural and physicochemical properties of the films, confirming the efficacy of the CFR process for depositing Zn(O,S) thin films in a short period of time. We successfully deposited Zn(O,S) thin films using the combined CFR process. Cd-free B:ZnO/Zn(O,S)/CIGS solar cells were fabricated on MoIP: 2038 10920 On: Thu 16 May 2024 06:24:51 coated glass substrates to investigateCopyright:the effectsAme ofican experimentalScientific Publishersparameters, such as deposition time and method, on the performance of the Zn(O,S) buffer layer in thdevices. Delivered by Inge nta-
dc.format.extent9-
dc.language영어-
dc.language.isoENG-
dc.publisherAmerican Scientific Publishers-
dc.titleInfluence of Deposition Parameters on Performance of Zn(O,S) Buffer Layer Deposited by Solution-Based Continuous Flow Reactor for CIGS Solar Cells-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1166/jno.2024.3578-
dc.identifier.wosid001229010600001-
dc.identifier.bibliographicCitationJournal of Nanoelectronics and Optoelectronics, v.19, no.3, pp 247 - 255-
dc.citation.titleJournal of Nanoelectronics and Optoelectronics-
dc.citation.volume19-
dc.citation.number3-
dc.citation.startPage247-
dc.citation.endPage255-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusCHEMICAL-BATH DEPOSITION-
dc.subject.keywordPlusTHIN-FILM-
dc.subject.keywordPlusCU(IN-
dc.subject.keywordPlusEFFICIENCY-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusDIFFUSION-
dc.subject.keywordPlusPH-
dc.subject.keywordAuthorZnS-
dc.subject.keywordAuthorZn(O, S)-
dc.subject.keywordAuthorThin Film Solar Cell-
dc.subject.keywordAuthorBuffer Layer-
dc.subject.keywordAuthorContinuous Flow Reactor (CFR).-
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