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Formation of Cu Substrate Micro-Patterned by Photolithography Method for Si Electrode and Its Electrochemical Properties

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dc.contributor.author조권구-
dc.date.accessioned2023-08-04T20:43:05Z-
dc.date.available2023-08-04T20:43:05Z-
dc.date.issued2011-12-07-
dc.identifier.urihttps://scholarworks.gnu.ac.kr/handle/sw.gnu/64080-
dc.titleFormation of Cu Substrate Micro-Patterned by Photolithography Method for Si Electrode and Its Electrochemical Properties-
dc.typeConference-
dc.citation.titleICON 2011-
dc.citation.conferenceNameInternational Conference on One-Dimensional Nanomaterials (ICON 2011)-
dc.citation.conferencePlace캐나다-
dc.citation.conferencePlace베이징-
dc.citation.conferenceDate2011-12-07 ~ 2011-12-09-
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공학계열 > Dept.of Materials Engineering and Convergence Technology > Conference Papers

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대학원 (나노신소재융합공학과)
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