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Structural and electrical properties of K(Ta,Nb)O-3 thin film prepared by sol-gel method for electrocaloric devices

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dc.contributor.authorKwon, Min-Su-
dc.contributor.authorKim, Ji-Won-
dc.contributor.authorPark, Joo-Seok-
dc.contributor.authorLee, Sung-Gap-
dc.date.accessioned2022-12-26T12:15:37Z-
dc.date.available2022-12-26T12:15:37Z-
dc.date.issued2020-12-
dc.identifier.issn1229-9162-
dc.identifier.issn2672-152X-
dc.identifier.urihttps://scholarworks.gnu.ac.kr/handle/sw.gnu/5853-
dc.description.abstractThis study investigated the structural and electrical properties of thin K(Ta0.6Nb0.4)O-3 films for their applicability to electrocaloric devices. Both of the sol-gel and spin coating methods were used to fabricate thin films. Those sintered at 650 degrees C showed a KTN phase with pyrochlore of K2Ta2O6, but those sintered at 750 degrees C showed pure polycrystalline phase without a pyrochlore phase. The lattice constants observed were a=3.990nm. The dielectric constant rapidly decreased due to decrease in polarization of space charge approximately at an applied frequency of 10 kHz. The dielectric constant and loss at 30 degrees C of the thin films sintered at 750 degrees C were 3,617 and 0.264. The dielectric constant of the specimen sintered at 750 degrees C decreased to about -8.27 %/V according to the applied DC field. The remanent polarization and coercive field at 36 degrees C of the specimen sintered at 750 degrees C were 20.0 mu C/cm(2) and 122.6 kV/cm. When the electric field of 247 kV/cm was applied to the specimen sintered at 750 degrees C, the highest electrocaloric property of 3.02 degrees C was obtained.-
dc.format.extent6-
dc.language영어-
dc.language.isoENG-
dc.publisherKOREAN ASSOC CRYSTAL GROWTH, INC-
dc.titleStructural and electrical properties of K(Ta,Nb)O-3 thin film prepared by sol-gel method for electrocaloric devices-
dc.typeArticle-
dc.publisher.location대한민국-
dc.identifier.doi10.36410/jcpr.2020.21.6.725-
dc.identifier.scopusid2-s2.0-85100569536-
dc.identifier.wosid000611500700014-
dc.identifier.bibliographicCitationJOURNAL OF CERAMIC PROCESSING RESEARCH, v.21, no.6, pp 725 - 730-
dc.citation.titleJOURNAL OF CERAMIC PROCESSING RESEARCH-
dc.citation.volume21-
dc.citation.number6-
dc.citation.startPage725-
dc.citation.endPage730-
dc.type.docTypeArticle-
dc.identifier.kciidART002661432-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryMaterials Science, Ceramics-
dc.subject.keywordPlusCERAMICS-
dc.subject.keywordAuthorK(Ta,Nb)O-3 thin films-
dc.subject.keywordAuthorFerroelectric-
dc.subject.keywordAuthorElectro-caloric effect-
dc.subject.keywordAuthorSol-gel method-
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