Cited 0 time in
K(Ta-0.60,Nb-0.40)O-3/K(Ta-0.40,Ta-0.60)O-3 heterolayered thin films for electrocaloric cooling device
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Jiwon | - |
| dc.contributor.author | Park, Jooseok | - |
| dc.contributor.author | Lee, Sunggap | - |
| dc.date.accessioned | 2022-12-26T10:45:41Z | - |
| dc.date.available | 2022-12-26T10:45:41Z | - |
| dc.date.issued | 2021-02 | - |
| dc.identifier.issn | 1229-9162 | - |
| dc.identifier.issn | 2672-152X | - |
| dc.identifier.uri | https://scholarworks.gnu.ac.kr/handle/sw.gnu/4147 | - |
| dc.description.abstract | In this study, K(Ta-0.60,Nb-0.40)O-3/K(Ta-0.40,Ta-0.60)O-3 heterolayered thin films were fabricated by spin coating method. KTN specimens were manufactured according to the number of coatings and were investigated in order to apply to cooling devices. KTN heterolayered thin films showed a polycrystalline KTN X-ray patterns with some pyrochlore phase. For the six-layer coated thin film of KTN, the values of dielectric constant, dielectric loss, remanent polarization and coercive field were 1423, 0.64, 19.94 mu C/cm(2) and 37.64 kV/cm at 28 degrees C. When a voltage of 330 kV/cm was applied to the 3 times coated KTN films, the electrocaloric property was 3 degrees C. When a voltage of 330 kV/cm was applied, the value of the electrocaloric temperature change (Delta T of the three-layer coated thin film. | - |
| dc.format.extent | 6 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | KOREAN ASSOC CRYSTAL GROWTH, INC | - |
| dc.title | K(Ta-0.60,Nb-0.40)O-3/K(Ta-0.40,Ta-0.60)O-3 heterolayered thin films for electrocaloric cooling device | - |
| dc.type | Article | - |
| dc.publisher.location | 대한민국 | - |
| dc.identifier.doi | 10.36410/jcpr.2021.22.1.48 | - |
| dc.identifier.scopusid | 2-s2.0-85103467928 | - |
| dc.identifier.wosid | 000630212500007 | - |
| dc.identifier.bibliographicCitation | JOURNAL OF CERAMIC PROCESSING RESEARCH, v.22, no.1, pp 48 - 53 | - |
| dc.citation.title | JOURNAL OF CERAMIC PROCESSING RESEARCH | - |
| dc.citation.volume | 22 | - |
| dc.citation.number | 1 | - |
| dc.citation.startPage | 48 | - |
| dc.citation.endPage | 53 | - |
| dc.type.docType | Article | - |
| dc.identifier.kciid | ART002685542 | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.description.journalRegisteredClass | kci | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Ceramics | - |
| dc.subject.keywordPlus | MICROSTRUCTURE | - |
| dc.subject.keywordAuthor | Potassium tantalite niobate | - |
| dc.subject.keywordAuthor | Electrocaloric effect | - |
| dc.subject.keywordAuthor | Thin film | - |
| dc.subject.keywordAuthor | Solgel method | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Gyeongsang National University Central Library, 501, Jinju-daero, Jinju-si, Gyeongsangnam-do, 52828, Republic of Korea+82-55-772-0532
COPYRIGHT 2022 GYEONGSANG NATIONAL UNIVERSITY LIBRARY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
