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Machining properties to nano-level mirror surface finishing for fine grained WC-Co 18% alloy using magnetic polishing slurry

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dc.contributor.authorKwak, T.-S.-
dc.date.accessioned2022-12-27T05:51:11Z-
dc.date.available2022-12-27T05:51:11Z-
dc.date.issued2009-
dc.identifier.issn1229-7801-
dc.identifier.issn2234-0491-
dc.identifier.urihttps://scholarworks.gnu.ac.kr/handle/sw.gnu/27050-
dc.description.abstract"This study has been focused on an effective surface finishing method combining ELID (ELectrolytic In-process Dressing) and MAP (Magnetic Assisted Polishing) for the nano-precision mirror grinding of glass-lens molding mould. ELID grinding is an excellent technique for mirror grinding of various advanced metallic or nonmetallic materials. A polishing process is also required for elimination of scratches present on ELID grinded surfaces. MAP has been used as polishing method due to its high polishing efficiency and superior surface quality. It also presents some techniques for achieving the nanometer roughness of the hard material such as WCCo, which are extensively used in precision tooling material.-
dc.format.extent6-
dc.language한국어-
dc.language.isoKOR-
dc.titleMachining properties to nano-level mirror surface finishing for fine grained WC-Co 18% alloy using magnetic polishing slurry-
dc.typeArticle-
dc.publisher.location대한민국-
dc.identifier.doi10.4191/KCERS.2009.46.1.102-
dc.identifier.scopusid2-s2.0-67649980265-
dc.identifier.bibliographicCitationJournal of the Korean Ceramic Society, v.46, no.1, pp 102 - 107-
dc.citation.titleJournal of the Korean Ceramic Society-
dc.citation.volume46-
dc.citation.number1-
dc.citation.startPage102-
dc.citation.endPage107-
dc.type.docTypeArticle-
dc.identifier.kciidART001313981-
dc.description.isOpenAccessY-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.subject.keywordAuthorGrinding-
dc.subject.keywordAuthorMagnetic materials-
dc.subject.keywordAuthorMechanical properties-
dc.subject.keywordAuthorNano-processing-
dc.subject.keywordAuthorTungsten/tungsten compounds-
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우주항공대학 (항공우주공학부)
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