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Cited 7 time in webofscience Cited 8 time in scopus
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Mechanical stability of Si thin film deposited on a Ti-50.3Ni(at%) alloy

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dc.contributor.authorKim, Bo-min-
dc.contributor.authorCho, Gyu-bong-
dc.contributor.authorNoh, Jung-pil-
dc.contributor.authorAhn, Hyo-jun-
dc.contributor.authorChoi, Eun-soo-
dc.contributor.authorMiyazaki, Shuichi-
dc.contributor.authorNam, Tae-hyun-
dc.date.accessioned2022-12-27T04:16:40Z-
dc.date.available2022-12-27T04:16:40Z-
dc.date.issued2010-05-14-
dc.identifier.issn0925-8388-
dc.identifier.issn1873-4669-
dc.identifier.urihttps://scholarworks.gnu.ac.kr/handle/sw.gnu/25098-
dc.description.abstractSilicon thin film annealed at 973 K for 7 2 ks after being deposited on a Ti-50.3Ni(at%) substrate was not detached from the substrate after 2 2% tensile deformation, which was ascribed to a diffusion bonding between the Si film and substrate. The B2-B19' transformation start temperature (M(s)) of the Ti-Ni substrate with Si thin film increased by annealing, which was ascribed to a tensile stress developed by the difference in thermal expansion coefficient between the Si film and substrate (C) 2010 Elsevier B.V. All rights reserved-
dc.language영어-
dc.language.isoENG-
dc.publisherELSEVIER SCIENCE SA-
dc.titleMechanical stability of Si thin film deposited on a Ti-50.3Ni(at%) alloy-
dc.typeArticle-
dc.publisher.location스위스-
dc.identifier.doi10.1016/j.jallcom.2010.03.023-
dc.identifier.scopusid2-s2.0-77951091291-
dc.identifier.wosid000278744600004-
dc.identifier.bibliographicCitationJOURNAL OF ALLOYS AND COMPOUNDS, v.497, no.1-2, pp L13 - L16-
dc.citation.titleJOURNAL OF ALLOYS AND COMPOUNDS-
dc.citation.volume497-
dc.citation.number1-2-
dc.citation.startPageL13-
dc.citation.endPageL16-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaChemistry-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaMetallurgy & Metallurgical Engineering-
dc.relation.journalWebOfScienceCategoryChemistry, Physical-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryMetallurgy & Metallurgical Engineering-
dc.subject.keywordPlusLI-ION BATTERIES-
dc.subject.keywordPlusNI-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusANODE-
dc.subject.keywordPlusTRANSFORMATION-
dc.subject.keywordPlusELECTRODE-
dc.subject.keywordPlusSYSTEM-
dc.subject.keywordAuthorShape memory alloys (SMA)-
dc.subject.keywordAuthorCoating-
dc.subject.keywordAuthorSilicon thin film-
dc.subject.keywordAuthorTension test-
dc.subject.keywordAuthorMartensitic phase transformation-
dc.subject.keywordAuthorAnode-
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