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Electrical properties of semiconducting YBa2Cu3O7-x thin film with variation of oxygen partial pressure

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dc.contributor.authorJeong, Jae-Woon-
dc.contributor.authorLee, Sung-Gap-
dc.contributor.authorJo, Seo-Hyeon-
dc.contributor.authorKim, Dae-Young-
dc.contributor.authorLee, Tae-Ho-
dc.date.accessioned2022-12-27T00:31:33Z-
dc.date.available2022-12-27T00:31:33Z-
dc.date.issued2013-08-
dc.identifier.issn1229-9162-
dc.identifier.issn2672-152X-
dc.identifier.urihttps://scholarworks.gnu.ac.kr/handle/sw.gnu/20563-
dc.description.abstractYBa2Cu3O7-x (YBCO) is the material of choice for second-generation superconducting wires and is the only current option for critical current density (J(c))> 1 MA/cm(2) at 77 K [1]. YBCO belongs to a class of copper oxides well known for their superconducting properties. Its conduction properties can be changed from metallic (0.5 < x < 1) to insulating (0x0.5) by suitably decreasing the oxygen content [2]. The structural, electrical and optical properties of YBa2Cu3O7-x can be varied by adjusting the oxygen content x [3, 4]. As x is decreased to 0.5, the crystal undergoes a phase transition to a tetragonal structure and it exhibits semiconducting conductivity characteristics as it exists in a Fermi glass state. YBCO precursor solutions were prepared by the sol-gel method YBCO films were fabricated by the spin coating method, and structural and its electrical were studied at various oxygen partial pressures. The films Ar/O-2 at 7 : 3 showed the more obvious YBa2Cu3O7-x phase and tetragonal phase. The thickness of all the films was approximately 0.23 similar to 0.31 mu m and the average grain size of the YBCO film Ar/O-2 at 7 : 3 was about 50 nm. Temperature resistance coefficient (TCR), responsivity, and detectivity of the YBCO film Ar/O-2 at 7 : 3 were 3.2%/K at room temperature, 14.72 V/W, and 2.27 cmHz1/2/W, respectively.-
dc.format.extent4-
dc.language영어-
dc.language.isoENG-
dc.publisherKOREAN ASSOC CRYSTAL GROWTH, INC-
dc.titleElectrical properties of semiconducting YBa2Cu3O7-x thin film with variation of oxygen partial pressure-
dc.typeArticle-
dc.publisher.location대한민국-
dc.identifier.scopusid2-s2.0-84890844704-
dc.identifier.wosid000332231000028-
dc.identifier.bibliographicCitationJOURNAL OF CERAMIC PROCESSING RESEARCH, v.14, no.4, pp 573 - 576-
dc.citation.titleJOURNAL OF CERAMIC PROCESSING RESEARCH-
dc.citation.volume14-
dc.citation.number4-
dc.citation.startPage573-
dc.citation.endPage576-
dc.type.docTypeArticle-
dc.identifier.kciidART002328391-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClasssci-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalWebOfScienceCategoryMaterials Science, Ceramics-
dc.subject.keywordPlusBOLOMETERS-
dc.subject.keywordAuthorYBCO-
dc.subject.keywordAuthorThin film-
dc.subject.keywordAuthorSol-gel-
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