Effect of Silicon on Growth and Temperature Stress Tolerance of Nephrolepis exaltata 'Corditas'

Abstract

Effect of silicon (Si) nutrition on growth and temperature stress tolerance of Nephrolepis exaltata 'Corditas' grown in a soilless substrate was examined. In vitro-grown acclimatized plantlets were transplanted into the pots containing a coir-based substrate. A nutrient solution containing 0, 50, or 100 mg.L-1 Si was supplied through a drip-irrigation system. After 5 months of cultivation, Si-treated and -untreated plants were grown at 10, 25, or 40 +/- 1 degrees C under a 12 h photoperiod with 530 mu mol.m(-2).s(-1) PPFD and 60% RH. After 7 days, chlorophyll content and chlorophyll fluorescence parameters were measured. Silicon nutrition had a negative effect on growth characteristics of N. exaltata 'Corditas'. However, Si-treated plants had more tolerance to temperature stress than the control plants. The Fv/Fm value was not significantly different when the plants were exposed to 25 degrees C. However, significant difference in Fv/Fm was recorded when plants were exposed to 10 or 40 degrees C. Thus, Fv/Fm could be used as an indicator of low and high temperature tolerance in ferns. The present study also suggests that application of Si may be used to enhance temperature tolerance of ferns.