Cited 2 time in
Fabrication of High Tolerance (Ca0.7Sr0.3)(Zr0.8Ti0.2)O-3 Interdigital Capacitors by Aerosol Deposition Based on Optimized Film Thickness and Simulation
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Hong-Ki | - |
| dc.contributor.author | Lee, Seung-Hwan | - |
| dc.contributor.author | Lee, Sung-Gap | - |
| dc.contributor.author | Lee, Young-Hie | - |
| dc.date.accessioned | 2022-12-26T20:03:27Z | - |
| dc.date.available | 2022-12-26T20:03:27Z | - |
| dc.date.issued | 2016-09 | - |
| dc.identifier.issn | 1947-2935 | - |
| dc.identifier.issn | 1947-2943 | - |
| dc.identifier.uri | https://scholarworks.gnu.ac.kr/handle/sw.gnu/15285 | - |
| dc.description.abstract | (Ca0.7Sr0.3)(Zr0.8Ti0.2)O-3 (CSZT) interdigital capacitors (IDCs) were fabricated via the aerosol deposition (AD) for use in embedded capacitor applications with high tolerance and stability. In order to miniaturize the device and to achieve superior electrical properties, the CSZT film thickness was optimized. Furthermore, a simulation was used to design the structure of the IDCs through the Momentum advanced design system (ADS). Consequently, the CSZT films thicker than 1 mu m thick on the Cu substrates were confirmed to have a dense surface morphology, stable dielectric properties with respect to frequency, applied voltage, and temperature, and low leakage currents. A trade-off between the optimum film thickness and the design provided by the simulation resulted in micro-sized CSZT IDCs (90x150 x 2 mu m), and these exhibited a self-resonant frequency of about 9 GHz, capacitance of 1.7 pF up to 8 GHz, and high tolerance for microwave frequencies. | - |
| dc.format.extent | 6 | - |
| dc.language | 영어 | - |
| dc.language.iso | ENG | - |
| dc.publisher | AMER SCIENTIFIC PUBLISHERS | - |
| dc.title | Fabrication of High Tolerance (Ca0.7Sr0.3)(Zr0.8Ti0.2)O-3 Interdigital Capacitors by Aerosol Deposition Based on Optimized Film Thickness and Simulation | - |
| dc.type | Article | - |
| dc.publisher.location | 미국 | - |
| dc.identifier.doi | 10.1166/sam.2016.2907 | - |
| dc.identifier.scopusid | 2-s2.0-85012042840 | - |
| dc.identifier.wosid | 000392835600020 | - |
| dc.identifier.bibliographicCitation | SCIENCE OF ADVANCED MATERIALS, v.8, no.9, pp 1832 - 1837 | - |
| dc.citation.title | SCIENCE OF ADVANCED MATERIALS | - |
| dc.citation.volume | 8 | - |
| dc.citation.number | 9 | - |
| dc.citation.startPage | 1832 | - |
| dc.citation.endPage | 1837 | - |
| dc.type.docType | Article | - |
| dc.description.isOpenAccess | N | - |
| dc.description.journalRegisteredClass | scie | - |
| dc.description.journalRegisteredClass | scopus | - |
| dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
| dc.relation.journalResearchArea | Materials Science | - |
| dc.relation.journalResearchArea | Physics | - |
| dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
| dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
| dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
| dc.subject.keywordPlus | ELECTRICAL-PROPERTIES | - |
| dc.subject.keywordAuthor | (Ca0.7Sr0.3)(Zr0.8Ti0.2)O-3 | - |
| dc.subject.keywordAuthor | Aerosol Deposition | - |
| dc.subject.keywordAuthor | Embedded Capacitor | - |
| dc.subject.keywordAuthor | Interdigital Capacitor | - |
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Gyeongsang National University Central Library, 501, Jinju-daero, Jinju-si, Gyeongsangnam-do, 52828, Republic of Korea+82-55-772-0532
COPYRIGHT 2022 GYEONGSANG NATIONAL UNIVERSITY LIBRARY. ALL RIGHTS RESERVED.
Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.
You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.
