Detailed Information

Cited 3 time in webofscience Cited 2 time in scopus
Metadata Downloads

Fabrication of High Tolerance (Ca0.7Sr0.3)(Zr0.8Ti0.2)O-3 Interdigital Capacitors by Aerosol Deposition Based on Optimized Film Thickness and Simulation

Full metadata record
DC Field Value Language
dc.contributor.authorKim, Hong-Ki-
dc.contributor.authorLee, Seung-Hwan-
dc.contributor.authorLee, Sung-Gap-
dc.contributor.authorLee, Young-Hie-
dc.date.accessioned2022-12-26T20:03:27Z-
dc.date.available2022-12-26T20:03:27Z-
dc.date.issued2016-09-
dc.identifier.issn1947-2935-
dc.identifier.issn1947-2943-
dc.identifier.urihttps://scholarworks.gnu.ac.kr/handle/sw.gnu/15285-
dc.description.abstract(Ca0.7Sr0.3)(Zr0.8Ti0.2)O-3 (CSZT) interdigital capacitors (IDCs) were fabricated via the aerosol deposition (AD) for use in embedded capacitor applications with high tolerance and stability. In order to miniaturize the device and to achieve superior electrical properties, the CSZT film thickness was optimized. Furthermore, a simulation was used to design the structure of the IDCs through the Momentum advanced design system (ADS). Consequently, the CSZT films thicker than 1 mu m thick on the Cu substrates were confirmed to have a dense surface morphology, stable dielectric properties with respect to frequency, applied voltage, and temperature, and low leakage currents. A trade-off between the optimum film thickness and the design provided by the simulation resulted in micro-sized CSZT IDCs (90x150 x 2 mu m), and these exhibited a self-resonant frequency of about 9 GHz, capacitance of 1.7 pF up to 8 GHz, and high tolerance for microwave frequencies.-
dc.format.extent6-
dc.language영어-
dc.language.isoENG-
dc.publisherAMER SCIENTIFIC PUBLISHERS-
dc.titleFabrication of High Tolerance (Ca0.7Sr0.3)(Zr0.8Ti0.2)O-3 Interdigital Capacitors by Aerosol Deposition Based on Optimized Film Thickness and Simulation-
dc.typeArticle-
dc.publisher.location미국-
dc.identifier.doi10.1166/sam.2016.2907-
dc.identifier.scopusid2-s2.0-85012042840-
dc.identifier.wosid000392835600020-
dc.identifier.bibliographicCitationSCIENCE OF ADVANCED MATERIALS, v.8, no.9, pp 1832 - 1837-
dc.citation.titleSCIENCE OF ADVANCED MATERIALS-
dc.citation.volume8-
dc.citation.number9-
dc.citation.startPage1832-
dc.citation.endPage1837-
dc.type.docTypeArticle-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaScience & Technology - Other Topics-
dc.relation.journalResearchAreaMaterials Science-
dc.relation.journalResearchAreaPhysics-
dc.relation.journalWebOfScienceCategoryNanoscience & Nanotechnology-
dc.relation.journalWebOfScienceCategoryMaterials Science, Multidisciplinary-
dc.relation.journalWebOfScienceCategoryPhysics, Applied-
dc.subject.keywordPlusELECTRICAL-PROPERTIES-
dc.subject.keywordAuthor(Ca0.7Sr0.3)(Zr0.8Ti0.2)O-3-
dc.subject.keywordAuthorAerosol Deposition-
dc.subject.keywordAuthorEmbedded Capacitor-
dc.subject.keywordAuthorInterdigital Capacitor-
Files in This Item
There are no files associated with this item.
Appears in
Collections
공학계열 > Dept.of Materials Engineering and Convergence Technology > Journal Articles

qrcode

Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.

Related Researcher

Researcher Lee, Sung Gap photo

Lee, Sung Gap
대학원 (나노신소재융합공학과)
Read more

Altmetrics

Total Views & Downloads

BROWSE