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Atomic layer deposition of MoO2 using a tetravalent precursor for template-driven rutile TiO2 growth in DRAM capacitors

Shin, Yoonchul; Jeon, Yeon-Ji; Kim, Ji Hwan; Hong, Chan-Bin; Yoon, Chang Mo; Kwon, Dong-Won; Kim, Se Yun; Ahn, Ji-Hoon

ArticleIssue Date2026CitationApplied Surface Science, v.728PublisherElsevier BV
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